Preparation of Ta/Mo Thin Films by RF-DC Coupled-Magnetoron Sputtering.
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چکیده
منابع مشابه
DEPOSITION OF THIN TiO2 FILMS BY DC MAGNETRON SPUTTERING METHOD
Sputter deposition process is another old technique being used in modern semiconductor industries. Sputtering is a process that can deposit TiO2 material on wafer/glass substrates. In this process target is connected to negative high voltage. Further argon gas is introduced into the chamber and is ionized to a positive charge. The positively charged argon atoms are attracted and strike the nega...
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ژورنال
عنوان ژورنال: SHINKU
سال: 1994
ISSN: 0559-8516,1880-9413
DOI: 10.3131/jvsj.37.255